化学气相沉积是半导体技术中一种常用的薄膜生长技术，这种技术使用化学的方法来沉积薄膜。化学气相沉积包括
Chemická depozice z plynné fáze | Chemische Gasphasenabscheidung | Chemical vapor deposition | Dépôt chimique en phase vapeur | Chemical vapor deposition | 化学気相成長 | CVD-proces
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"化学气相沉积".
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